 |
|
|
Patterning of Material Layers in Submicron Region |
| U. S. Tandon; W. S. Khokle |
| A coherent, comprehensive treatment of three submicron patterning technologies vying with each other to become the principal writing tool of the multitrillion dollar microelectronic industry. Features a detailed analysis of the various aspects of the three latest technologies—e-beam, ion beam and x-ray lithography. Compact synchrotron sources and x-ray mask preparation self-developing resists are described with tables and figures.
|
|
| Cloth Bound |
183 Pages,
|
Item #:
Price: |
0470220635
$96.00 |
John Wiley & Sons, Inc. | |
|
|
|
|
