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Photo-induced Metastability in Amorphous Semiconductors |
| Editor: Alexander V. Kolobov (Laboratory for Advanced Optical Technology, National Institute for Advanced Industrial Science and Technology, Tsukuba, Japan) |
| A review summarising the current state of research in the field, bridging the gaps in the existing literature. All the chapters are written by world leaders in research and development and guide readers through the details of photo-induced metastability and the results of the latest experiments and simulations not found in standard monographs on this topic. A useful reference not only for graduates but also for scientific and industrial researchers.
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| Cloth Bound |
424 Pages
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Item #:
Price: |
3527403701
$190.00 |
John Wiley & Sons, Inc. | |
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